| abstract |
(57) [Problem] To provide a method for producing a photoresist polymer compound having high solubility in a resist solvent comprising a glycol solvent, an ester solvent, a ketone solvent and the like. SOLUTION: The present invention relates to a method for producing a polymer compound for a photoresist whose solubility in an alkali is changed by the action of an acid, wherein the polymerization solvent is selected from a glycol solvent, an ester solvent, and a ketone solvent. Provided is a method for producing a polymer compound for a photoresist, comprising a step of polymerizing using one or more kinds of solvents to be performed and filtering a polymerization reaction solution containing the produced polymer. The polymerization solvent is propylene glycol monomethyl ether, Propylene glycol monomethyl ether acetate, At least one solvent selected from ethyl lactate and methyl isobutyl ketone is preferred. |