| abstract |
(57) [Problem] To provide a positive chemically amplified resist composition excellent in various resist performances such as sensitivity and resolution, and particularly excellent in SEM resistance and dry etching resistance. The polymer contains at least one polymer unit selected from the group consisting of polymer units represented by the following formulas (Ia) and (Ib), and is itself insoluble or hardly soluble in an aqueous alkaline solution, A resin that becomes soluble in an aqueous alkali solution by the action of A chemically amplified positive resist composition containing an acid generator and a polyfunctional epoxy compound. ..... (Ia) (Ib) (wherein, R 1 , R 2 , R 3 and R 4 each independently represent a hydrogen atom or a methyl group, and n represents an integer of 1 to 3. R 2 May be the same or different from each other when When 4 is plural, they may be the same or different. ) |