http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003186176-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-12 |
| filingDate | 2001-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a187aa555fb12707f603e1fa9d5ce8a |
| publicationDate | 2003-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003186176-A |
| titleOfInvention | Photomask material, photomask and manufacturing method thereof |
| abstract | [57] [PROBLEMS] To form a mask pattern with high sensitivity, high speed and high resolution with light having a wavelength of 405 nm or more, capable of correcting a defect, and having mechanical strength, hardness and solvent resistance. Provided is a photomask material that can produce a high-quality photomask that has excellent properties, has a low light reflectance of a wavelength of less than 405 nm, and has no white defect. SOLUTION: i) an alkali-soluble resin binder having a polymerizable unsaturated bond on a light-transmitting substrate; ii) A photosensitizer comprising at least one monomer having a polymerizable unsaturated bond, iii) a photopolymerization initiation system having photosensitivity in a wavelength region of 405 nm or more, and iv) a colorant surface-treated with a polymerizable dispersant. A photomask material comprising a photosensitive layer, and the photosensitive layer being formed by coating. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009237556-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009237555-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010230826-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006337726-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008176218-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010079265-A |
| priorityDate | 2001-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 294.