http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003178688-A

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filingDate 2001-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003178688-A
titleOfInvention Extraction electrode system of ion implanter and ion implanter
abstract (57) [Problem] To provide an extraction electrode system and an ion implantation apparatus of an ion implantation apparatus capable of efficiently extracting an ion beam even at a low acceleration voltage and extracting an ion beam in a predetermined direction. provide. An extraction electrode system is provided in an ion beam generation chamber of an ion implantation apparatus and includes two or more extraction electrodes for extracting ions generated by an ion source and generating an ion beam IB. The extraction electrode has an electrode body and a mounting plate, and the relative permeability of the mounting plate 13 of the extraction electrode 8 at least at the position closest to the ion source is the mounting plate 15 of at least one other set of extraction electrodes 9. The extraction electrode system 7 of the ion implantation apparatus, which is smaller than the relative magnetic permeability of
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