| abstract |
(57) Abstract: In a process of manufacturing various liquid crystal display devices and semiconductor devices, a photoresist layer formed on an inorganic substrate, Photoresist residue and dust generated at the time of etching can be easily removed, and at that time, Provided is a photoresist stripping agent and a photoresist stripping method that do not corrode various semiconductor layer materials, conductive materials or insulating film materials to be used. (A) an alkanolamine; and (b) an alkanolamine having at least one structure represented by the following formula (1) in one molecule. (Wherein, R 1 and R 2 independently represent hydrogen or a methyl group.) (C) an amide solvent or a sulfoxide solvent; A photoresist stripper composition comprising (d) a phosphorus-containing compound, (e) an oxycarboxylic acid, and (f) water. |