| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1374dd16777534b65ad4422333245af8 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L67-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2002-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d813ee7f6126df4526e36f26f08ead6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f68a8eb462ca09bf124d78ad8b3ec8df
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_460dfba00fb310e0fce07f9f6a2c9cbd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ae04d8ea62cee7d6f6beab9bac8f801
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbc94fb349712035fcfb2b01e2d9d888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f21e655934523c33df73b99f4b6aa3b7 |
| publicationDate |
2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003177542-A |
| titleOfInvention |
Polyester film |
| abstract |
(57) [Problem] To provide a polyester film which exhibits excellent substrate followability to a substrate having an uneven shape and is used for a support layer of a photoresist film having excellent resolution. SOLUTION: This is a film comprising a copolyester containing 0.001 to 0.5% by weight of spherical monodispersed silica having an average particle size of 2.5 μm or less as a lubricant and having a melting point of 210 to 250 ° C. A polyester film used for a support layer of a photoresist film, wherein the plane orientation coefficient of the film is 0.09 to 0.16. |
| priorityDate |
2002-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |