http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003176323-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18 |
| filingDate | 2002-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41aaa2380ad51f3afa594bacbe991bae |
| publicationDate | 2003-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003176323-A |
| titleOfInvention | Chemically amplified photoresist polymer and photoresist composition |
| abstract | PROBLEM TO BE SOLVED: To provide a chemically amplified photoresist polymer and a photoresist composition suitable for ArF excimer light. A chemically amplified photoresist polymer represented by the general formula (I). Embedded image In the general formula (I), R 1 is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a cycloalkoxy group having 3 to 12 carbon atoms. R 2 and R 4 are each a hydrogen atom or a methyl group, R 3 is a cyclohexyl group, and R 5 is ter any one of a t-butyl group, a tetrahydropyranyl group and a 2-methyladamantyl group, and a / (a + b + c) is 0.2 to 0.8, and b / (a + b + c) is 0.05. ０．５0.5, c / (a + b + c) is 0.1〜0.5. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007009175-A |
| priorityDate | 2001-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 67.