| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8a16e2fa556744225f7c2bba36087e7f |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-03 |
| filingDate |
2001-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9402d447f9185798956a5ae380223be
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9cb8551b8ba21d59309d94c3fcd0b3a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87da69a106694e002a00cddf39effc89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e8a5a8d7f896f38575d767ac1959ffb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e0612f2f6a6aa502aa08fab8dee41fe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc7f320c09c0a67bb8420bb27209206b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de632e1c03781dadcf4e81c1305813b1 |
| publicationDate |
2003-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003167344-A |
| titleOfInvention |
Polyimide and its precursor, photosensitive resin composition, and method for producing pattern |
| abstract |
(57) [Summary]nAn object of the present invention is to provide good i-line permeability and low imidation. Polyimide and its precursor that have both thermal expansion properties, excellent Photosensitive resin composition capable of forming heat resistant pattern Provides a manufacturing method for the turn.nSOLUTION: Polyimide and its precursor, photosensitive resin set Manufacture of products and patternsnGeneral formula (1)nEmbedded imagen General formula (2)nEmbedded imagen General formula (3)nEmbedded imagen General formula (4)nEmbedded imagen (Where R 1 And R 2 Are each independently a hydrogen atom or a monovalent Organic group. R 3 ~ R 10 Are each independently a hydrogen atom or At least one hydrocarbon group; You. R 11 ~ R 18 Are each independently a hydrogen atom or a fluorine atom Groups containing at least one fluorine atom Group. X is an ether bond, a carbonyl bond, a sulfo It is either an oxide bond or a sulfone bond. ) Characterized by containing a repeating structural unit represented by Manufacturing method of polyimide precursor, polyimide and pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160126974-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102301297-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015125469-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106462057-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006270029-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015125469-A1 |
| priorityDate |
2001-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |