http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003149874-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G9-13 |
| filingDate | 2001-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f073783b1c2abee86598a23c8cf49af4 |
| publicationDate | 2003-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003149874-A |
| titleOfInvention | Liquid developer for electrostatic photography |
| abstract | (57) [Problem] To develop a liquid developer excellent in dispersion stability, redispersibility and fixability even in an electrophotographic plate making system using a master plate having a large plate size with a rapid development-fixing process. To provide. A monomer (A) that is soluble in a non-aqueous solvent and becomes insoluble by polymerization, a monofunctional macromonomer (MM) having a fluorine atom and / or silicon atom-containing substituent, and at least a specific component A dispersion containing a dispersion stabilizing resin (P) dispersed in a colloidal manner in the non-aqueous solvent and a seed particle (CR) having an average particle size of 0.05 to 1.0 μm as a seed. Dispersion resin particles (CSR) having a multi-layer structure, obtained by polymerization reaction, have an electrical resistance. Liquid development for electrophotography, dispersed in a non-aqueous solvent with 10 9 Ω · cm and a dielectric constant of 3.5 or less. |
| priorityDate | 2001-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 283.