http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003147022-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ead90443277482e25bf91bfddef2b5a7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 |
| filingDate | 2001-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdc2555cd53bbde3de089f7311c8e181 |
| publicationDate | 2003-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003147022-A |
| titleOfInvention | Syndiotactic substituted hydroxystyrene polymer and photosensitive composition |
| abstract | (57) [Summary] [PROBLEMS] To provide a photosensitive material such as a chemically amplified positive resist material excellent in balance among various properties such as heat resistance, sensitivity and resolution. SOLUTION: This is a substituted hydroxystyrene-based polymer in which a hydroxyl group is partially protected by an acid labile group represented by the general formula (1), and the phenyl group has a C1 carbon tacticity of 13 C-. A syndiotactic-substituted hydroxystyrene-based polymer having a racemic pentad content of at least 30% by NMR, and a photosensitive composition containing a syndiotactic-substituted hydroxystyrene-based polymer represented by the general formula (1) and an acid generator Composition. Embedded image (Wherein R 1 represents an acid labile group, a: b is 0.1 to 0.9: Each shows a molar ratio of 0.9 to 0.1. ) |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018180069-A1 |
| priorityDate | 2001-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 393.