http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003142411-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-26 |
| filingDate | 2001-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b5b6fe0e0ef5d675109530473429d05 |
| publicationDate | 2003-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003142411-A |
| titleOfInvention | Semiconductor manufacturing equipment |
| abstract | (57) [Summary] [PROBLEMS] To make a thin film uniform by epitaxial growth. Kind Code: A1 A processing chamber for forming a closed space, a heating means for heating a wafer in the closed space, and a disk-shaped susceptor having a mounting surface for mounting the wafer. A preheating ring 50 that has a ring shape and the inside of which closely fits the peripheral edge of the susceptor 40, and a support member 11 that is provided in a closed space and supports the susceptor 40 from the back, The susceptor 40 is connected to the preheating ring 50 via the support member 11. And a driving means for rotating the same. The outer circumference of the preheating ring 50 is uniformly close to the inside of the processing chamber 20 via a gap, and the processing chamber 20 is configured to supply the reaction gas to supply the reaction gas into the upper region of the closed space. It has a port 21 and an exhaust port 22 for exhausting exhaust gas from the area. Further, the supply port 21 is disposed radially outside the preheating ring 50 and is set in a direction in which the reaction gas is blown toward the center of the susceptor 40, and the exhaust port is It is provided at a position facing the supply port 21 with the susceptor 40 interposed therebetween. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014179582-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10240235-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014179581-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101461272-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111517257-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111288889-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113604795-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113604795-B |
| priorityDate | 2001-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.