| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2001-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 |
| publicationDate |
2003-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003140344-A |
| titleOfInvention |
Positive photosensitive composition |
| abstract |
[PROBLEMS] To provide a positive photosensitive composition which is excellent in edge roughness and does not generate scum. (A) a specific sulfonium salt compound that generates an acid upon irradiation with actinic rays or radiation, and (B) a monocyclic or polycyclic alicyclic hydrocarbon structure that decomposes by the action of an acid A positive photosensitive composition comprising a resin having increased solubility in a developer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100938529-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011095623-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006259277-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016181722-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005266766-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4491335-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8158326-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008065266-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007505946-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4579019-B2 |
| priorityDate |
2001-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |