http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003140334-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6c8d4dc7bd1a30d8fda907fceaeb4e69 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2001-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abe80730d04f387b30c8ecb332f6e82b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d1fabda829962bab239a6366632ae73 |
| publicationDate | 2003-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003140334-A |
| titleOfInvention | Photopolymerizable image forming material and image forming method |
| abstract | (57) [Abstract] [Purpose] In addition to suppressing the effect of polymerization inhibition by oxygen in the photopolymerizable composition layer, it has excellent resolution and excellent safelight properties, and can be handled in a bright room. A novel photopolymerizable image forming material and an image forming method are provided. The present invention relates to a photopolymerizable image-forming material having a photopolymerizable composition layer on a substrate, and the exposure energy [S 1 required for a residual film ratio of an exposed portion to become 50% when subjected to image exposure and development processing. (MJ / cm 2 )], forming a 0.5 to 2 μm-thick polyvinyl alcohol layer on the photopolymerizable composition layer, exposing the image under the same conditions, removing the polyvinyl alcohol layer, and developing. A photopolymerizable image forming material having a ratio [S 1 / S 2 ] of exposure energy [S 2 (mJ / cm 2 )] required for the residual film ratio of the exposed portion to become 50% in the range of 1 to 5 And an image forming method comprising subjecting the photopolymerizable composition layer of the photopolymerizable image forming material to scanning exposure with near-infrared laser light having a wavelength range of 750 to 1200 nm, followed by development processing with an alkali developing solution. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4915477-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9075307-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007072314-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007041343-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8778594-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4900510-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8835095-B2 |
| priorityDate | 2001-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 379.