| abstract |
PROBLEM TO BE SOLVED: To provide an alkali-based processing liquid which can reduce the amount used and the amount of waste liquid generated during processing, and has excellent solubility in an organic film such as a photoresist after exposure, and an apparatus for supplying the same. SOLUTION: In a developer supply device 100, a pretreatment unit 20 such as a filter 2, an adjustment tank 5, and a leveling tank 6 are provided at a subsequent stage of a receiving tank 1 connected to a development processing apparatus 210 via a pipe L1. It is connected continuously. Further, a liquid supply system 8 and a control device 9 are connected to the adjustment tank 5, and the concentration meter 51, The concentrations of the dissolved photoresist component and the alkali component in the used liquid W are adjusted to constant values based on the measured values obtained by 52. The obtained regenerating liquid is supplied to the developing device 210 through the pipe L2. |