http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003131381-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2001-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fcb142bcea5ae883356b016617eda596 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f864158dec12379d4ad6a32fe029d1c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a20104ecee0ec4bcd8f7e4cf2aa6743 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b36d5bfe2e6c486590f546177af97b6 |
publicationDate | 2003-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2003131381-A |
titleOfInvention | Positive resist composition |
abstract | (57) [Abstract] [Problem] While maintaining excellent dry etching resistance, Provided is a positive resist composition capable of providing a resist which has improved pattern shrinkage during SEM observation and does not require metal removal. [1] In a positive resist composition containing a resin which is insoluble or hardly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and an acid generator, the resin is generally A positive resist composition having a polymerized unit represented by the formula (I). [2] The resin is 80 with respect to the total weight of the resin and the acid generator. The positive resist composition according to [1], wherein the content of the acid generator is from 20 to 0.1% by weight. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101739151-B1 |
priorityDate | 2001-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 185.