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filingDate 2001-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2003-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003119344-A
titleOfInvention Hybrid compound, resist material and pattern forming method
abstract (57) [Summary] A phenol resin and the following general formula (1): R 1 n Si (OR 2 ) 4-n (1) (wherein R 1 is a monovalent compound containing a sulfur atom or an oxygen atom) R 2 represents a monovalent hydrocarbon group, and n represents 1 Or 2. A) a hybrid compound comprising a silicone resin obtained by hydrolyzing and condensing the organooxysilane represented by the formula (1). According to the present invention, it is possible to provide a hybrid compound which is used as a base polymer of a resist material and gives excellent adhesion to a metal substrate.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101142999-B1
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