http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003114530-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_06836496fbb35de4839e8a82a3cd8963 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2001-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d84af3086bc8309b2f588cfd22a1a07 |
publicationDate | 2003-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2003114530-A |
titleOfInvention | Positive photosensitive resin composition |
abstract | (57) [Summary] [PROBLEMS] To be developed with an alkaline aqueous solution and have high sensitivity Moreover, a photosensitive resin capable of easily forming a patterned thin film having excellent properties such as high resolution, developability, heat resistance, solvent resistance, adhesion to a substrate, transparency, and heat discoloration resistance. Provided is a composition, and a photosensitive resin composition capable of easily forming a patterned thin film having excellent low dielectric properties simultaneously with the above properties. SOLUTION: It contains tetrafluoroethylene, a monomer containing a carboxyl group, a fluorine-containing copolymer obtained by copolymerizing a monomer copolymerizable therewith, and a cyclohexane derivative containing a 1,2-naphthoquinonediazide group. Positive photosensitive resin composition. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013227280-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108572516-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108572516-A |
priorityDate | 2001-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 286.