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filingDate 2001-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea7b8a3284626c3bd8cbd870849003d5
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publicationDate 2003-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003100915-A
titleOfInvention Semiconductor device and method of manufacturing the same
abstract [PROBLEMS] To provide a semiconductor device including a MONOS type nonvolatile memory device and a method of manufacturing the same. A semiconductor device according to the present invention includes a memory cell (10). Contains 0. The memory cell 100 includes a word gate 1 formed on a semiconductor substrate 10 with a first gate insulating layer 12 interposed therebetween. 4, impurity layers 16 and 18, and first and second control gates 20 and 30 having a sidewall shape. A pair of first and second control gates adjacent via the impurity layers 16 and 18 are connected to the common contact part 200. The common contact part 200 includes a first contact conductive layer 214, a second contact conductive layer 232, and a pad-shaped third contact conductive layer 260. Third contact conductive layer 260 is provided on first contact conductive layer 214 and second contact conductive layer 232.
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