| abstract |
(57) [Problem] To prevent the surface of a resist adhesion preventing layer from being attacked by cleaning with a cleaning solvent and from being attacked by a solvent composed of polyhydric alcohol or a derivative thereof contained in a photoresist. Accordingly, there is provided a surface protective film having extremely high mold release persistence with respect to a resist without lowering its resist adhesion preventing property. SOLUTION: The undercoat layer and the resist adhesion preventing layer are provided on one surface of a transparent polymer film in this order, and the surface protection film is provided with an adhesive layer on the other surface, wherein the undercoat layer is hexamethoxymethylmelamine. Wherein the resist adhesion preventing layer is obtained by curing an addition reaction type silicone composition to which a silane coupling agent has been added, and the silane coupling agent has an epoxy group in a molecule. Γ-glycidoxypropyltrimethoxysilane having the following formula: |