http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003084441-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2002-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464180103f87187b3aab20511a8537b7 |
| publicationDate | 2003-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003084441-A |
| titleOfInvention | Positive photosensitive composition |
| abstract | [PROBLEMS] To provide a positive photosensitive composition in which the edge roughness of a pattern is improved, development defects are suppressed, and the variation in line width over time is improved. (A) An acid generator that generates an acid upon irradiation with actinic rays or radiation, and (B) an alkali developer having a monocyclic or polycyclic alicyclic hydrocarbon structure that decomposes by the action of an acid. A positive photosensitive composition comprising a resin having increased solubility therein and (C) at least two basic compounds having different structures. |
| priorityDate | 2001-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 363.