| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9df90d7822cc480ce12c480f4089e229 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-457
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 |
| filingDate |
2001-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8812e5b34498a4898f62713f3721d5c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b46642106dae2f664ffea897541155b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28d2820beac0064c5ef6d41e98668c84 |
| publicationDate |
2003-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003081673-A |
| titleOfInvention |
Method for producing sintered indium-tin oxide |
| abstract |
(57) [Problem] To provide a method capable of manufacturing a large-sized ITO sintered body useful as a sputtering target for producing a transparent conductive film in a short time. A mixture of a compound containing indium and oxygen and a compound containing tin and oxygen, or indium, A method for producing an indium-tin oxide sintered body, characterized in that a compound containing tin and oxygen is used as a raw material, and a DC pulse current is applied under pressure to conduct sintering. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013082822-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101135732-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101116908-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I384523-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9162286-B2 |
| priorityDate |
2001-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |