| abstract |
(57) [Problem] To provide a single layer having performance satisfying high requirements such as dry etching resistance, heat resistance, adhesion to a substrate, sensitivity, etc., and a resist pattern shape which is not changed by an environmental basic substance. Provided is a resist composition for a resist, and a pattern forming method using the resist composition. A surface layer imaging comprising an amino resin having a carboxyl group or a phenolic hydroxyl group and a photoacid generator. Resist composition, and Forming a resist layer comprising the resist composition on a substrate, forming a silylated layer on the surface of the resist layer, and forming a first resist pattern on the silylated layer by pattern exposure And a fourth step of dry-developing the pattern-exposed portion with a gas containing oxygen using the primary resist pattern as a mask to form a resist pattern. |