| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-84 |
| filingDate |
2002-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5854ef1b237b7f9966a2da8efe6d62a8 |
| publicationDate |
2003-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003075991-A |
| titleOfInvention |
Photomask blank, glass substrate for photomask blank, and photomask |
| abstract |
(57) Abstract: A photomask blank, a glass substrate for the photomask blank, and a photomask capable of manufacturing a photomask with high pattern accuracy are provided. SOLUTION: An uneven shape of a main surface 1 of the photomask blank is a plane substantially parallel to a reference plane 2 substantially parallel to the main surface, or has a curved surface shape which is a substantially simple convex or concave shape. ing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7838182-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008139848-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005043836-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005043835-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7463338-B2 |
| priorityDate |
2002-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |