| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4903b7b4b84e3b845aef791cad8f2e97 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2204-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-087
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-093 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B3-00 |
| filingDate |
2001-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d98152ad35760a1602e92663adc11cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed232fdfe2d052233caf740e929b9681
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f481be8d967fc022549ea35044e84a35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd102ecb8e722257bd3524e69119b642 |
| publicationDate |
2003-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003073145-A |
| titleOfInvention |
Fine processing method of glass substrate, glass substrate for fine processing and fine processed glass product |
| abstract |
PROBLEM TO BE SOLVED: To provide a method for finely processing a glass substrate and a glass substrate for fine processing for efficiently forming an uneven shape having a controlled height and width at an arbitrary position on the surface of the glass substrate. thing. SOLUTION: An area where an etching rate for an etching solution to be used is different from other portions is provided on a surface of a glass substrate and in the vicinity thereof, and then the glass substrate is chemically etched with the etching solution to obtain a glass substrate. A method for finely processing a glass substrate for forming irregularities on the surface of a material, and a region having an etching rate for an etching solution to be used which is different from other portions on a surface of the glass substrate and in the vicinity thereof, and It is a glass substrate for fine processing that has the ability to form irregularities on the surface of the glass substrate by a selective etching process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008026437-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014132983-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9278882-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7354526-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007197250-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7305982-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7407889-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016013612-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7086339-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005008442-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102923962-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102923962-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011152289-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006082999-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019006643-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004078668-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020132508-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130132608-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101617071-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004078667-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4537961-B2 |
| priorityDate |
2001-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |