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publicationDate 2003-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003060310-A
titleOfInvention Semiconductor optical device and method of manufacturing the same
abstract (57) Abstract: Provided is a semiconductor optical device having a structure capable of controlling diffusion of a p-type impurity into a semi-insulating buried layer, and a method for manufacturing the same. SOLUTION: On a semiconductor substrate 1, a laminate comprising at least a first conductive type clad layer 2, an active region formed of an active layer 4 or a light absorbing layer, and a second conductive clad layer 6 is formed as a mesa stripe. In a buried semiconductor optical device in which both sides of the laminated body are buried with semi-insulating semiconductor crystals 9 and 10, the semi-insulating semiconductor crystals 9 and 10 are formed of the second conductivity type impurity. A layer 9 containing a semi-insulating impurity for promoting diffusion and a layer 10 containing a semi-insulating impurity for suppressing diffusion of the second conductivity type impurity are provided in this order.
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