| abstract |
(57) [PROBLEMS] To provide an excellent photosensitivity of 160 nm or less, specifically, sufficient transparency when using a light source of F 2 excimer laser light (157 nm), and having little dependency on line edge roughness and development time. It is to provide a resin composition. A resin that decomposes by the action of an acid having a specific structure to increase the solubility in an alkaline developer, a compound that generates an acid represented by the general formula A 1 H upon irradiation with actinic rays or radiation, a general formula B + a 2 - ionic compound represented by a photosensitive resin composition containing a solvent, and a surfactant, an acid generated upon irradiation with actinic rays or radiation a 1 H and ionic compounds B + a A photosensitive resin composition, wherein a salt exchange reaction in which 2 − is represented by A 1 H + B + A 2 − → B + A 1 − + A 2 H is performed. |