| abstract |
(57) Abstract: A chemically amplified positive resist composition suitable for excimer laser lithography such as ArF or KrF, which has various resist performances such as sensitivity and resolution and is particularly improved. Provided is a positive chemically amplified resist composition that provides improved line edge roughness. Kind Code: A1 A chemically amplified positive resist composition containing a resin which is insoluble in alkali but soluble in alkali by the action of an acid, an acid generator, and a biadamantane derivative. As the biadamantane derivative, the following formula (I) (I) wherein R 1 and R 2 independently represent hydrogen or an ester group. |