| abstract |
PROBLEM TO BE SOLVED: To provide a resist composition for a chemically amplified positive-type liquid crystal device, which is inexpensive, has excellent characteristics such as excellent resolution and sensitivity, and small film loss, and the like. Providing resist patterns. SOLUTION: The following components (A) to (C), (A) 2.3 An alkali-soluble resin comprising a novolak resin having an alkali solubility in an aqueous solution of 8% by weight of tetramethylammonium hydroxide in the range of 375 to 1000 ° / sec; (B) a chemically-amplified resist composition for a positive-type liquid crystal element obtained by dissolving a compound that generates an acid upon irradiation with radiation and (C) a crosslinkable polyvinyl ether compound in an organic solvent; A resist pattern for a liquid crystal element obtained by providing a coating film using a resist composition for a chemically amplified positive type liquid crystal element, drying, exposing through a mask pattern, performing heat treatment after exposure, and then alkali developing. |