http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003035944-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-498 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 |
| filingDate | 2002-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3057fd7f63d65a9a74e4368ff7c4d4f6 |
| publicationDate | 2003-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003035944-A |
| titleOfInvention | Thermal development method for photothermographic material and photothermographic material thereof |
| abstract | [PROBLEMS] To provide a heat development method for a heat-developable photographic light-sensitive material which has good flatness after heat development and does not cause burn-out failure. The amounts of warpage of the ends of the four sides after heat development are all 0 mm / 50 cm or more and 4 mm / 50 cm or less, Change in thermal dimension at 120 ° C for 30 seconds in both longitudinal and width directions A method for thermally developing a heat-developable photographic light-sensitive material, wherein a heat-developable photographic light-sensitive material having a temperature of 0.05 to + 0.05% is heated at 1 ° C./second to 15 ° C./second and then heat-developed. |
| priorityDate | 1998-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 136.