http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003034705-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S522-914 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-22 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D207-452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-22 |
| filingDate | 2001-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45ab10ac46b553303aa2f45b678649dd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2dceee9615b6868bdcf31f385147769 |
| publicationDate | 2003-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003034705-A |
| titleOfInvention | Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition and pattern forming method using the same |
| abstract | (57) [Problem] To provide a photoresist material suitable for lithography using light of 180 nm or less, its raw material, and a method capable of forming a fine pattern. SOLUTION: The fluorine-containing phenylmaleimide derivative of the formula (1). A polymer obtained by polymerizing a monomer containing this derivative. Having a weight average molecular weight of 2,000 to 20 including the structural unit of the formula 2 Ten thousand polymers. It contains the above polymer and a photoacid generator, and the ratio of the polymer to the sum of the polymer and the photoacid generator is 70 to 99.8. A chemically amplified resist composition which is% by mass. This composition is applied on a substrate to be processed, and exposed to light having a wavelength of 180 nm or less, Baking, developing pattern forming method. Embedded image In both formulas, one of R 1 to R 5 represents an OH group, an alkoxyl group, or an acid dissociable organic group having 20 or less carbon atoms which is decomposed by an acid to generate a hydroxyl group, and at least two of the remaining are a fluorine atom. If there is a residue, it represents a hydrogen atom. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004029720-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015184458-A |
| priorityDate | 2001-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 111.