http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003026796-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dbdfa36b677f4ef61245ca725011e221 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_40dd791eb9a6d730b2a4e8b9c8aa9b54 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G69-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2001-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_77b1efa4b5d38309c250937985f88abf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60c3d6d376bdfb015165515fcfb12a5f |
| publicationDate | 2003-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003026796-A |
| titleOfInvention | Photosensitive polyamide and composition |
| abstract | (57) [Problem] A photosensitive resin composition capable of obtaining a pattern with high sensitivity, high residual film ratio, and high contrast, and at the same time, excellent in resolution and pattern shape of a fine pattern, and also excellent in stability. Offer things. SOLUTION: A photosensitive polyamide represented by the following general formula is dissolved in a solvent to obtain a photosensitive resin composition. (Wherein X 1 is a tetravalent organic group; X 2 and X 3 are divalent organic groups. A + b = 100 mol%, a = 60.0 to 100 mol%, b = 0 to 40.0 mol% D is 1,2-naphthoquinonediazide-4 (or 5) -sulfonic acid ester residue or hydrogen atom, and 1,2-naphthoquinonediazide-4 (Or 5) -Sulfonate residue is 1-5 of all D 0%. Z: divalent organic group. ) |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012168487-A |
| priorityDate | 2001-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 310.