http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003015283-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 |
| filingDate | 2001-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d784695368287472b9a3125aa2aa1e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12cee763db29fa152edc93ce28ca8c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f01d90d59abaf51b0aa76dc7fb981dd4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4566e477ce3657aab1dde528ff23a26d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf58444c2649cb9ce86bc0ac39fc8840 |
| publicationDate | 2003-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003015283-A |
| titleOfInvention | A photosensitive element for forming a diffuse reflection base layer and a method for manufacturing a diffuse reflection plate using the same. |
| abstract | PROBLEM TO BE SOLVED: To form a diffuse reflection underlayer for producing a diffusion reflection plate excellent in substrate adhesion of a diffusion reflection underlayer under high temperature and high humidity without partial peeling of a metal thin film with high yield. A photosensitive element is provided. SOLUTION: In a photosensitive element for forming a diffuse reflection underlayer formed by laminating a layer of a photosensitive resin composition on a concave-convex surface of a temporary support having a concave-convex surface, the photosensitive resin composition comprises: I) an unsaturated group-containing acrylic polymer (c) obtained by reacting an acrylic resin (a) having a carboxyl group with a compound (b) having both an alicyclic epoxy group and an unsaturated bond in the molecule; II) at least 2 A photosensitive element for forming a diffuse reflection underlayer, comprising a photopolymerizable compound having two ethylenically unsaturated groups and (III) a photopolymerization initiator. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017537346-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007094217-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007219020-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007119761-A |
| priorityDate | 2001-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 113.