http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003005459-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G9-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G9-12 |
filingDate | 2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f073783b1c2abee86598a23c8cf49af4 |
publicationDate | 2003-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2003005459-A |
titleOfInvention | Liquid developer for electrostatic photography |
abstract | (57) [Problem] To develop a liquid developer excellent in dispersion stability, redispersibility and fixability even in an electrophotographic plate making system using a master plate having a large plate size with a rapid development-fixing process. To provide. A monomer (A) that is soluble in a non-aqueous solvent and becomes insoluble by polymerization, a monofunctional monomer (B) having a fluorine atom and / or silicon atom-containing substituent, and a specific component A polymer containing at least a star-type dispersion stabilizing resin [P] soluble in the non-aqueous solvent and an average particle size of 0.05 to A dispersion resin particle (CSR) having a multi-layer structure obtained by subjecting a dispersion liquid containing 1.0 μm seed particles (CR) to a seed polymerization reaction is made of non-water having an electric resistance of 10 9 Ω · cm to a dielectric constant of 3.5 or less. Electrostatographic liquid development dispersed in a solvent. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2017002847-A1 |
priorityDate | 2001-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 220.