http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003003156-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B53-017
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filingDate 2001-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fb53bca5619b69af9f5840ad6b2b674e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b2f8e7e8e7ebfb1a34fbe81c474b220
publicationDate 2003-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003003156-A
titleOfInvention Anti-clogging composition for polishing pad
abstract (57) Abstract: An anti-clogging agent composition for a polishing pad capable of reducing clogging of a polishing pad and preventing a reduction in polishing rate and generation of surface defects such as pits even in continuous polishing. Provided is a method for manufacturing a substrate to be polished using a clogging inhibitor composition for a polishing pad. Kind Code: A1 An anti-clogging composition for a polishing pad for use in polishing an object to be polished containing nickel, comprising a carboxylic acid having 2 to 20 carbon atoms and having an OH group or an SH group, having 1 to 20 carbon atoms. Monocarboxylic acid having 2 to 3 carbon atoms Dicarboxylic acid, α-amino acid having 2 to 3 carbon atoms, 3 carbon atoms The anti-clogging agent for a polishing pad comprising at least one compound selected from the group consisting of enol organic acids and salts thereof of 0.01 to 10% by weight and less than 2% by weight, and water. And a method for producing a substrate to be polished by using the anti-clogging agent composition for a polishing pad.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005001019-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005001018-A
priorityDate 2001-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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