| titleOfInvention |
Alkali-soluble acrylic resin composition, photosensitive transparent insulating film forming material, method for producing color filter protective film, method for producing reflective underlayer, colored image forming material, method for producing color filter, and color filter |
| abstract |
PROBLEM TO BE SOLVED: To provide a pattern formation time faster than alkali development, a longer time from the start of pattern formation until the pattern shape is deformed, and a substrate other than glass and organic materials, such as ( Provided is an alkali-soluble acrylic resin composition which significantly improves the adhesion to an (oxidized) metal (ITO electrode, Al, etc.) substrate, and a color filter and the like using this composition. SOLUTION: A monomer having one N-substituted maleimide group is 5 to 30% by weight, a monomer having a carboxyl group is 5 to 30% by weight, and a monomer having one hydroxyl group is 5 to 30% by weight. An alkali-soluble acrylic resin composition containing a polymer obtained by polymerizing 30% by weight and a monomer having one benzene ring and a cyclo ring in an amount of 10 to 85% by weight, a method for producing a color filter using the same, and the like. |