| abstract |
(57) [Problem] To provide a method for cleaning a microelectronic substrate using an ultra-dilute cleaning solution. A method for cleaning a surface of an article (106) using a cleaning liquid (120) in combination with sonic energy (126). Preferably, an ultra-dilute concentration of a detergency enhancing material, such as ammonia gas, is dissolved in a liquid solvent, such as filtered deionized water, to form a cleaning solution. The cleaning solution is brought into contact with the surface to be cleaned. During such contact, sonic energy is applied to the liquid. If desired, the surface to be cleaned may be oxidized before cleaning, for example with ozonated water. |