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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2002-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d7ec343f8f9b0415970bc6b6c443cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06bdc247272bf8871948fa94720009f4
publicationDate 2002-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002373864-A
titleOfInvention Oxygen doping method for gallium nitride crystal and n-type gallium nitride single crystal substrate doped with oxygen
abstract (57) [PROBLEMS] To provide a method for growing a gallium nitride single crystal capable of incorporating oxygen as an n-type dopant. SOLUTION: A gallium nitride while maintaining a surface other than the C-plane while supplying a source gas containing a gallium raw material, a nitrogen raw material, and oxygen to be doped using a seed crystal having a surface other than the C-plane as a surface (upper surface). The gallium nitride crystal is doped with oxygen through the surface by vapor-growing the crystal. Alternatively, a gallium nitride crystal is formed while generating a facet plane other than the C plane while supplying a source gas containing a gallium raw material, a nitrogen raw material, and oxygen to be doped using a seed crystal having a C plane on the surface, and maintaining the facet plane. Is vapor-phase grown in the c-axis direction to dope oxygen into the gallium nitride crystal through the facet plane.
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