http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002365804-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2001-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b40ada315d0789564192dceb9481ef6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c0735952117143eac179e69a1ee7b6c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_381de81b1f3fad7df1c4007aacaa45f8 |
publicationDate | 2002-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2002365804-A |
titleOfInvention | Radiation-sensitive resin composition |
abstract | PROBLEM TO BE SOLVED: To provide a high sensitivity, high resolution, high radiation transmittance, and fine pattern surface without impairing basic resist properties such as pattern shape, dry etching resistance and heat resistance. Provided is a radiation-sensitive resin composition having excellent smoothness and capable of eliminating partial insolubilization during overexposure. SOLUTION: (A) An adamantane derivative represented by t-butyl adamantane carboxylate, di (t-butoxycarbonylmethyl) adamantane dicarboxylate, (B) an alkali-insoluble or sparingly alkali-soluble resin having a hydroxystyrene-based repeating unit and a repeating unit having an acid-dissociable group, and (C) a radiation-sensitive resin containing a radiation-sensitive acid generator. Composition. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009102659-A |
priorityDate | 2001-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 868.