| abstract |
PROBLEM TO BE SOLVED: To provide mixed oxide particles for chemically-mechanically polishing semiconductor substrates and layers placed on these substrates, which are custom-made for special polishing purposes. An oxide particle having a core, a doping component distributed in the core, and a shell surrounding the core, wherein the core, the doping component, and the shell have different chemical compositions. These are produced by first introducing a doping component into the metal oxide or metalloid oxide core by aerosol in a pyrolysis method. The subsequently doped core is coated by treating it with a metal or metalloid salt solution, drying it and, optionally, baking. The particles can be used for chemical-mechanical polishing. |