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filingDate 2001-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5f22a87dd07d4b32b222b0852749309
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publicationDate 2002-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002355564-A
titleOfInvention Ion adsorbent
abstract [PROBLEMS] To provide an ion adsorbent capable of adsorbing and removing fine particles, colloidal substances and metal ions to an extremely low concentration in an ultrapure water production process in the semiconductor field. SOLUTION: This is an ion adsorbent in which a functional group having an ion exchange function is introduced on the surface of a resin sintered porous body, and has an ion exchange capacity of 0.5 to 10 meq / g. body.
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