| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D498-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2002-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9374f4123bd8b1b64d636e0d35cca04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_278135abcea06da9bc7ccfbae4bddad6 |
| publicationDate |
2002-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002341544-A |
| titleOfInvention |
Photosensitive resin composition for system error detection of exposure equipment |
| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive composition which forms an image in which an exposed portion and a non-exposed portion can be distinguished only by exposure to radiation, has high sensitivity, and is sufficient and sufficient for alignment measurement of an exposure apparatus. To provide a photosensitive resin composition provided with stable exposure visualization. SOLUTION: The mask pattern is transferred onto the photosensitive resin composition film by transferring the mask pattern onto the photosensitive resin composition film only by exposure to radiation, and detecting the image formation state of the transfer pattern image. A photosensitive resin composition for detecting a system error of the exposure apparatus at the time, wherein A) a compound which generates an acid upon exposure to radiation and B) a volume changes due to a reaction between the acid generated from the above A). A photosensitive resin composition for detecting a system error of an exposure apparatus, comprising a resin. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014178279-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105143977-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014178279-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102207676-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102207676-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9746775-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010251746-A |
| priorityDate |
2001-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |