Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7688 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
filingDate |
2002-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09cb229f8e14e1351852b77533b2b079 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a36b9d92343d9903a6af53330bf2c0b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43482adf579675b55662390605365f38 |
publicationDate |
2002-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2002334926-A |
titleOfInvention |
Use of a sacrificial layer to facilitate metallization for microstructures |
abstract |
(57) [Problem] To provide a method of manufacturing a copper wiring using a sacrificial layer. SOLUTION: An SiC layer (106) is formed on a dielectric layer (102). A sacrificial layer (108) is formed on the SiC layer (106). Sacrificial layer (108), SiC Grooves (112) are formed in layer (106) and dielectric layer (102) by etching. Sacrificial layer (108) Is sputter-etched to form a dielectric layer (10 An opening wider than the upper part of 2) is formed on the sacrificial layer (108). A barrier layer (114) and a copper seed layer (116) are formed. The trench (112) is filled with copper (124). C Using MP, extra copper (124) and barrier layer (114) Is removed and fixed on SiC (106). |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007043100-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012064713-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2007043100-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005538544-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006351899-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4549937-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101336962-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013258408-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012510164-A |
priorityDate |
2001-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |