| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad2cd796f8c4dcb425ddcc68707d3444 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-435
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F283-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L77-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17 |
| filingDate |
2001-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38ff5523ad78e74a4043673d71df6c07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_232da37b01ca1ea14498f7c5bc1ee826 |
| publicationDate |
2002-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002333706-A |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
(57) [Summary] (Modified) [Problem] To improve the heat stability of a polyamide photosensitive resin plate material. The following A.I. ~ E. A photosensitive resin composition comprising the components of A. Soluble polyamide resin B. Photopolymerizable unsaturated compound having terminal ethylenic double bond C. D. Photopolymerizable initiator The following general formula (1) and / or Or a naphthoquinone derivative represented by (2) E. FIG. N-nitrosohydroxylamine derivative represented by the following general formula (3) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100672890-B1 |
| priorityDate |
2001-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |