http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002328115-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_510fe4292ddee41a1b95cdd5a1ae06c1 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-02809 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-2425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-1702 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-00 |
| filingDate | 2001-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8a87f8fac218c0037114f9b77413ec4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_609ad9511d23d664e9160c10ce6ffc30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9cba0aa5b98b2e7a19dc41182079641 |
| publicationDate | 2002-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002328115-A |
| titleOfInvention | Method of manufacturing gas diffusion filter for photoacoustic gas sensor |
| abstract | PROBLEM TO BE SOLVED: To provide a method for manufacturing a gas diffusion filter for a photoacoustic gas sensor having stable characteristics, which is suitable for being integrated into a small-sized photoacoustic gas sensor. SOLUTION: An Si substrate 11 is etched substantially perpendicularly from one surface to form a concave portion 12 which forms a cavity of a photoacoustic gas sensor, and a portion located outside the concave portion is substantially separated from the other surface by the Si substrate. A partition 18 having a predetermined thickness is formed on the Si substrate by vertical etching [first step], and then a predetermined region excluding the partition is masked to anodize the partition to form a porous silicon forming a gas diffusion filter. The layer 19 is formed [second step]. |
| priorityDate | 2001-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14917 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457280313 |
Total number of triples: 20.