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filingDate 2001-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a7717e56caf344d8120edeb0cfc4a20
publicationDate 2002-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002326898-A
titleOfInvention Group III nitride crystal growth method and group III nitride crystal growth apparatus
abstract (57) [Summary] [PROBLEMS] To manufacture a device such as a high-performance light-emitting diode or LD at a practical size and at low cost. III capable of growing high-quality group III nitride crystals A group nitride crystal growth method and a group III nitride crystal growth apparatus are provided. SOLUTION: A mixed melt holding container 102 contains a mixed melt 103 composed of Ga as a group III metal and Na as an alkali metal. Where Na Is 99%, the purity of Ga is 99.99999%, the purity of nitrogen gas is 99.999%, and the mixed melt holding vessel 102 When the material is a sintered body of BN, the solid object 110 has a shape in which a hole 111 is partially formed. Nitrogen dissolves into the mixed melt 103 through the hole 111, In the mixed melt 103, a single crystal 109 of GaN as a group III nitride can be grown.
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