http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002323763-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
| filingDate | 2001-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ce14f0766c685654f0ca6e2afd04f5d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45c252583cde8d06ccecefeda60d1649 |
| publicationDate | 2002-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002323763-A |
| titleOfInvention | Photosensitive composition |
| abstract | PROBLEM TO BE SOLVED: To provide a lithographic printing plate excellent in abrasion resistance, printing durability, and chemical resistance, and having a large printing durability even when printing with UV ink without burning treatment. , Furthermore, the range of development conditions is wide, and no stain is generated at the time of printing. Disclosed is a photosensitive composition which is excellent in coupling performance, ballpoint pen suitability, sensitivity, and storage stability, and provides a lithographic printing plate having a small decrease in performance such as sensitivity fluctuation with time after exposure. SOLUTION: This is a photosensitive composition containing a vinyl polymer type polymer compound and o-naphthoquinonediazide which are insoluble in water and soluble in an alkaline aqueous solution, wherein the vinyl polymer type polymer compound is represented by a specific general formula. A photosensitive composition comprising a copolymer having at least one monomer unit derived from a compound having an alkali-soluble group and a monomer unit having an onium group represented by a specific general formula. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4597655-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006067944-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006171656-A |
| priorityDate | 2001-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 388.