http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002309641-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_976dcf207c443cf11a5d4ad1b479f257 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/E03C1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J35-02 |
filingDate | 2001-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4a6911d89ae59661da5a4a49fbb3429 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4b654876719c2be421c46e8ad0c2ebf |
publicationDate | 2002-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2002309641-A |
titleOfInvention | Photocatalytic bacteria blocking drain trap |
abstract | (57) [Summary] [Object] To kill bacteria and microorganisms that grow in trap water sealing which is a drawback of conventional drain traps, it is necessary to frequently supply water manually and treat sewage in a wastewater treatment facility. Or sterilization by directly injecting the drug into the sealed water, but the present invention kills various bacteria or microorganisms that grow in the sealed water by spraying or baking the photocatalytic material on the side and bottom surfaces of the drain trap. It is intended to develop a detachable floor drain trap capable of blocking bacteria from the outside. A titanium oxide as a photocatalyst material is sprayed or baked on an inner side surface and a bottom surface of a trap body to form a trap lid. The germs and microorganisms that grow in the sealed water 4 are killed by utilizing the light rays entering from the water. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006274572-A |
priorityDate | 2001-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.