| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d527f9a5c3e991a1797de3518a88d14 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-582 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B09B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B09B3-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B09B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B09B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J11-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B1-00 |
| filingDate |
2001-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7e39d00f78294feacdeddd33cebc4b8 |
| publicationDate |
2002-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002301446-A |
| titleOfInvention |
Circuit member processing equipment |
| abstract |
(57) Abstract: Provided is a circuit member processing apparatus suitable for treating circuit members such as a multilayer substrate with supercritical water. A multilayer substrate (2) and supercritical water are formed in a reaction chamber (14) having a hollow elliptical cylinder having a hollow elliptical cross-section including a central portion having a small curvature and being substantially straight and an end having a large curvature. Since the reaction is performed, the central portion of the reaction chamber 14 is suitable for carrying an object having a flat shape such as the multilayer substrate 2. Moreover, since the end of the reaction chamber 14 has a large curvature, the surface area of the inside of the reaction chamber 14 can be increased at the end. 4 can withstand such high pressures. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005000490-A3 |
| priorityDate |
2001-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |