| abstract |
[PROBLEMS] To form an ITO film on a coating-type insulating film, Provided is a liquid crystal display device capable of eliminating display defects on a liquid crystal display surface by reducing contact resistance between an ITO film and a lower metal film without generating etching residues, and a method for manufacturing the same. A scanning line and a signal line arranged in a matrix on a substrate, a TFT connected to the scanning line and the signal line, and a TFT In a method of manufacturing a liquid crystal display device having a pixel electrode connected via a coating-type interlayer insulating film to a substrate, the substrate temperature when forming a transparent conductive film on the interlayer insulating film is set to 100 to 17 0 ° C. When a transparent conductive film is formed on the interlayer insulating film, the oxygen flow rate is reduced to 1% or less without heating, and annealing is performed after the film formation. |