| abstract |
(57) [Problem] To provide a pattern forming method capable of forming a nano-order pattern having a uniform structure and regularity at low cost and at a high degree of position control. SOLUTION: A step of forming a resin layer (2) containing a copolymer on a substrate (1), and infrared, visible, ultraviolet or ionizing radiation (3) in a predetermined region of the resin layer. And a step of subjecting the irradiated resin layer to a thermal annealing treatment to develop a microphase-separated structure in the unirradiated portion (6) of the resin layer. |